In order to study the damage behaviors of optical mirrors induced by film defects (as film bumps, film pits and film contaminants) in high-power CW laser, a simulation study was carried out, which considered temperature, thermal stress and thermal deformation in results. The results show that the bumps of the film will primarily absorb laser energy, and its temperature, thermal stress and thermal deformation will become extremely high, which is easy to damage the film; similarly, the film pits will also absorb laser energy for its temperature rise, and the pits will expand to the inwards. The larger the size of the pits, the larger the expansion of melting range will be, and eventually damage the film layer; after absorbing the laser energy, the temperature of the film contaminants is very high (for film contaminants size of 150 μm, its maximum temperature reaching 900 K), even exceeding the damage temperature (523 K) that the film can withstand, and finally causing the film to be ablated.

为了研究高功率连续激光器中薄膜缺陷（薄膜凸块、薄膜凹坑和薄膜污染物）引起的光学镜损伤行为，进行了模拟研究，结果考虑了温度、热应力和热变形。 。结果表明，薄膜的凸块主要吸收激光能量，其温度、热应力和热变形会变得极高，很容易损坏薄膜；同样，薄膜凹坑也会因温度升高而吸收激光能量，凹坑会向内扩展。凹坑尺寸越大，熔化范围扩大越大，最终损坏膜层；吸收激光能量后，薄膜污染物的温度非常高（对于尺寸为150μm的薄膜污染物，其最高温度达到900K），甚至超过了薄膜所能承受的损伤温度（523K），最终导致待烧蚀的薄膜。