Magnesium fluoride (MgF₂) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings, meta-surface anti-reflection layer, and chemically resistive passivation. The deposition was performed in a commercially available Picosun® R-200 Advanced ALD reactor. Characterization of composition, density, optical property, chemical resistivity and coverage were performed. ALD-deposited films showed high R + T at wavelength down to 350 nm, excellent 3D coverage, and high chemical resistivity. This technology enables unique properties to improve 3D structured optics such as metasurface.

中文翻译：

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原子层沉积氟化镁的光学、化学和覆盖性能

研究了使用原子层沉积（ALD）沉积的氟化镁（MgF ₂）薄膜用作光学涂层、超表面抗反射层和化学电阻钝化。沉积在市售的 Picosun® R-200 Advanced ALD 反应器中进行。进行了成分、密度、光学性质、耐化学性和覆盖率的表征。 ALD 沉积薄膜在低至 350 nm 的波长下表现出高 R + T、出色的 3D 覆盖率和高耐化学性。该技术具有独特的性能，可改善超表面等 3D 结构光学。